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内容説明
Heteroepitaxial films are commonplace among contemporary electronic and photonic devices. The realization of better devices relies on the refinement of epitaxial techniques and improved understanding of the physics underlying epitaxial growth. This book provides a report on a wide range of materials systems. The first half reviews metallic and dielectric thin films， including chapters on metals， rare earths， metal-oxide layers， fluorides and high-Tc superconductors. The second half covers semiconductor systems， reviewing developments in group-IV， arsenide， phosphide， antimonide， nitride II-VI and IV-VI heteroepitaxy. Topics important to several systems are covered in chapters on atomic processes， ordering and growth dynamics.