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内容説明
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine ’runs，’ thereby minimizing process drift， shift， and variability-and with them， costs. Its effectiveness has been demonstrated in a variety of processes， such as vapor phase epitaxy， lithography， and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. ?Run to Run Control in Semiconductor Manufacturing? overcomes that barrier by offering in-depth analyses of R2R control.
Book Description
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine ?runs，? thereby minimizing process drift， shift， and variability-and with them， costs. Its effectiveness has been demonstrated in a variety of processes， such as vapor phase epitaxy， lithography， and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.